Description
An Optical metrology tool for real-time monitoring and control of vacuum thin film deposition processes and dry etching by: AccuStrata
AtOMS | Thin Film Atomic Optical Monitoring System
- VERSATILE INSTALLATION FOR PVD CHAMBERS
- FIBER OPTIC BASED MEASUREMENT SYSTEM
Completely fiber optics-based solutions enables the use of switches that rapidly change system config. to allow accurate data processing - BROAD SPECTRUM DETECTOR
Allows for a single detector to be used for rapid element detection - ELEMENTAL SELECTIVIITY
Leads to precis multi-element composition monitoring - 3 PROBE CHANNELS
Monitor multiple locations to view variations across systems
Applications:
- VACUUM PROCESSES
- Physical Vapor Deposition
- Magnetron Sputtering
- Ion Beam Sputtering
- Electron Beam Evaporation
- Thermal Evaporation
- Molecular Beam Epitaxy
- Plasma Etching
- COATING TYPES
- Complex Multilayer & Thin Film Structures
- Extremely Thin Multilayers
- Coatings with Engineered Interface Layers
- Thin Films and Structures with Gradient Bandgap Profiles
- Multi-Element Coating
- Alloys & Compounds
Features
- Over 80 + single elements and multi-element light sources enable element selectivity
- Co-deposition: each element can be monitored individually
- Measure independent of substrate shape, orientation and motion
- Configure up to 3 probing beams in a single AtOMS system
- Suitable for both deposition and etch processes
- Measures process from within chamber
- Measures only the region where the process is occurring
- Installation on chambers with minimal retrofitting
- Configure in multi bounce geometry for even greater sensitivity
- Increasing validation of new elements as more research is developed
Unique
What sets AtOMS apart is the novel approach to process control. By integrating Atomic Absorption and Optical Emission Spectroscopy (AAS & OES) with our specially engineered components, this patented system offers you capability beyond what is currently available elsewhere. The fiber optic sensor approach allows installation of a variety of custom settings without retrofitting of the customer’s equipment.
Customizable
A single system can monitor up to 4 chemical elements simultaneously, displaying each individual element deposition rate and the composition of the compound film as it is deposited/etched. With over 60 elements available, we can target the unique materials you require. In addition, up to three probe channels enable monitoring support distributed monitoring for multi-step, multi-chamber processes or more detailed data acquisition on process uniformity in a single chamber.
Adaptive
AtOMS is designed to accommodate your existing chamber configurations and geometries. Installation versatility is facilitated by our flexible fiber optic sensors specially designed by our engineers for optimal performance for the most demanding optical emission and atomic absorption spectrometry applications.
AtOMS | Thin Film Atomic Optical Monitoring System
Product Demonstration Videos
Questions? Review the AtOMS FAQ sheet under Downloads!
